Design on motion controller of grinding and polishing robot based on ARM;
基于ARM的研磨抛光机器人运动控制器的设计
With plexiglass is taken as experiment object, the robot grinding and polishing processing technology is introduced, the grinding and polishing parameters optimal designing method is discussed, and grinding and polishing experiments are implemented.
以有机玻璃为研究对象,介绍了机器人研磨抛光工艺,讨论了研磨抛光参数优化设计方法,并进行了研磨抛光试验。
In the paper, the central hardware structure and software modules of motion controller of grinding and polishing robot are designed.
本文设计了研磨抛光机器人运动控制器的核心硬件结构和软件模块,采用了参数模糊自整定PID机器人关节位置控制策略,通过实验表明该运动控制器可以大大降低研磨抛光机器人的位置跟踪误差。
Investigation on Mechanisms and Rules about Lapping & Polishing Process for End-faces of Optical Fiber Connectors;
光纤连接器端面研磨抛光机理与规律研究
polished dressing
磨光，抛光，敷面打光，研磨
The most common finishing operations are mechanical, such as milling, grinding, or polishing with abrasives.
最普通的精加工工序是用机械的方法，如研磨，磨削或用磨料抛光。
Research on the Polishing of Silicon Wafer by Fixed Abrasive Pad
固结磨料抛光垫抛光硅片的探索研究
a tool or machine used for wearing down or smoothing or polishing.
用来磨平打磨或抛光的工具或机器。
Chemical mechanical polishing for silicon wafer by composite abrasive slurry
利用复合磨粒抛光液的硅片化学机械抛光
Design and Motion Simulation of Curved Surface Polishing Mechanism with Tri-Grinding-Head
三磨头曲面抛光机构设计及运动仿真
Study on Erosion Mechanisms and Polishing Technology of Hard-Brittle Materials Machined with Precision Abrasive Waterjet;
精密磨料水射流加工硬脆材料冲蚀机理及抛光技术研究
Study on the Technologic Parameter and Wear Model of Retaining Ring in Chemical Mechanical Polishing Process;
化学机械抛光保持环工艺参数及磨损模型的研究
Study on the Mechanism and Arts of Magnetorheological Finishing (MRF) by Nano-sized Diamond Abrasives
纳米金刚石磨料磁流变抛光材料去除机理与工艺研究
Experimental study on polishing of mobile phone panel glass with unfixed-abrasive and fixed-abrasive pad
游离和固结金刚石磨料抛光手机面板玻璃的试验研究
Research of Polishing Technology for InSb Semiconductor Materials
InSb半导体材料抛光研磨技术研究
head ,grinding, sharpening, polishing, trueing and cutting, of natural stone, abrasives or pottery
研磨、磨、磨利、抛光、整形和切割头,天然石料,研磨料或陶质料制
Fixed abrasive lapping and polishing:present situation and prospect
固结磨料研磨与抛光的研究现状与展望
Study on Conditioner for Polishing Pad in CMP;
化学机械抛光用抛光垫修整器的研究
Research of the Dynamic Gasbag Polishing Abrasive Particles Field and Temperature Characteristics
气囊抛光磨粒场形态与温度特性研究
Research on Plane Polishing Using Instantaneous Tiny Grinding Wheel Based on Magnetorheological Effect
磁流变效应即效微磨头平面抛光研究
Influence of abrasive and chemical composition on chemo-mechanical polishing of MgO single crystal substrate
抛光液中磨料和化学成分对单晶MgO基片化学机械抛光的影响
