A buried-oxide trench-gate bipolar-mode JFET(BTB-JFET)with an oxide layer buried under the gate region to reduce the gate-drain capacitance Cgd is proposed.
提出了埋氧沟槽栅双极模式JFET(BTB-JFET),其在栅极区域下面添加埋氧以减小栅漏电容Cgd。
It is shown that neglecting the gate-drain capacitance of the MOSFET would lead to an overestimation of the optimum device width in the CMOS source degenerated LNA.
本文证明了在CMOS源端degeneration结构的低噪声放大器中，忽略场效应管的栅漏电容将造成对放大管的最优栅宽估计过大。
Simulation results show that the gate-drain capacitance CGD of normally-on BTB-JFET has an improvement up to 25% than that of TB-JFET at zero source-drain bias.
仿真中借鉴现有的高性能T-MOSFET的结构尺寸,并采用了感性负载电路对器件进行静态以及混合模式的电特性仿真,结果表明,常开型BTB-JFET与TB-JFET相比,零偏压时栅漏电容CGD减小25%;当工作频率为1MHz和2MHz时常开型TB-JFET与T-MOSFET相比总功耗分别降低了14%和19%,而常开型BTB-JFET较TB-JFET的总功耗又进一步降低了6%。
