Advanced CVD equipment,internal coating technique,performance of coating for internal channels of.
结果表明:研制的CVD设备可靠、工艺参数稳定、内腔表面涂层涂覆达到100%,所研究的化学气相渗铝涂层具有优良的高温抗氧化性能,其在先进航空发动机高效气冷空心叶片内腔表面有很好的工程应用前景。
The direct photo-CVD SiO2 thin films were deposited successfully on silicon substrate at low temperature by using the SiH4 and O2 as the reaction gas and the low pressure Xe excited vacuum ultra-violet (VUV) as the photon source.
在低温下采用以低压Xe气激发真空紫外光作光源,以SiH_4和O_2作为反应气体的直接光CVD技术在硅衬底上成功地淀积出SiO_2薄膜。
The lighting equipments for ranway in airdrome are important for flight security in night and complicate weather conditions.
机场助航灯光设备是保障夜间和复杂气象条件下飞行的重要设备。
Analysis and Solutions to Unsteady Gas Flow of CVD
CVD设备气流不稳定因素分析及解决方案
Reserches of Equipment Design and Process Mechanics about CVD(CVI) Silica;
CVD/CVI氧化硅设备研制及工艺机理探索
The application of reactive power compensator to DC-Arc plasma CVD diamond equipment
无功功率补偿技术在直流电弧CVD金刚石设备中的应用
The Preparation of Cubic Boron Nitride Thin Films by ECR CVD System and Study of Their Properties;
ECR CVD制备立方氮化硼薄膜及性能研究
The Fabrication of Continuous High Performance SiC Fiber by Chemical Vapor Deposition;
CVD法制备高性能SiC连续纤维技术
Computer Control System of Producing Carbon Nanotubes with CVD;
CVD法制备纳米碳管的计算机控制系统
The Study of A-Si-H Films Prepared by MWECR CVD;
MWECR CVD制备a-Si:H薄膜光稳定性研究
Simulation of Growth Process of Titania Nanoparticles Synthesized by Flame CVD Process;
火焰CVD法制备TiO_2纳米颗粒的数值模拟
The Preparation of Device-Quality Hydrogenated Amorphous Silicon Thin Films by Mwecr-Cvd Assisted by Hot-Wire;
热丝辅助MWECR-CVD制备器件级非晶硅薄膜
Deposition Process Study of Device Quality a-Si:H Film by Method of MWECR CVD with High Deposition Rate;
MWECR CVD高速制备a-Si：H薄膜的工艺研究
Synthesis and Characterization of Aligned Carbon Nanotubes Prepared by CVD;
CVD法制备定向纳米碳管及其表征
Study on Growth and Optical Emission of a-SiN_x: H Films Prepared by ECR-CVD;
ECR-CVD制备a-SixN：H薄膜及其发光性能的研究
Study of MWECR CVD Deposition Technique for a-Si:H and Properties of a-Si:H;
a-Si:H薄膜的MWECR CVD制备及特性研究
Technical Study on Deposition of B-C Films by MWECR CVD Method;
MWECR CVD法制备B-C薄膜的工艺研究
Development of Preparative Technique and Application of Chemical Vapor Deposition Diamond(Film)
CVD金刚石膜制备技术及应用进展
Preparations and Characteration of single phosphorus-doped p-type ZnO nanowire
CVD法制备单根磷掺杂P型ZnO纳米线
The Analysis of CVD Process for High Purity Titanium
CVD法制备高纯钛形核过程动力学分析
Synthesis of multiwall carbon nanotubes by decomposition of methane over vanadium container catalysts
用含钒催化剂CVD法制备多壁纳米碳管
