A Study on PVP and PVK by Surface Enhanced Raman Spectra and the Preparation of Metal Colloids by Laser Ablation;
聚乙烯吡咯烷酮和聚乙烯咔唑的表面增强拉曼光谱研究及激光刻蚀金属胶体的制备
The influences of laser ablation processes on the solubility and the crystallizability of laser evaporated Al2O3-ZrO2 nanopowders were studied by X-ray diffractometer (XRD), X-ray absorption fine structure (XAFS) spectroscope and high resolution electron microscope (HREM).
利用X射线衍射, X射线吸收精细结构谱和高分辨电镜研究了激光刻蚀工艺对 Al2O3-ZrO2固溶度和结晶度的影响。
The micrometer-scaled channels with different width and depth on the Si surface were prepared by pulse laser ablation.
因此,利用激光刻蚀表面方法可以在一定程度上调控固体表面的润湿性能。
With the continuousgrowth of electronic technology, photochemical etching tech-nology has expanded into many new application fields and aproduction scale is formed.
介绍了光化蚀刻的由来和传统工艺流程中五种掩膜的制作方法及四种现代的光化蚀刻法流程及其应用范围。
Surface treatments in liquid phase using laser-laser plating and laser etching were reviewed.
对液相中的激光表面处理－ 激光电镀和激光刻蚀进行综述，阐述了有关原理和应用。
The method for the graphic input in a laser-induced thermal etching system and writingdevice is described.
介绍了激光蚀刻、书写设备中的图形输入方法，着重讨论了图像预处理、直线段识别和圆弧识别的数学方法。
Preparation of Metal Nanoparticles by Laser Ablation and Its Spectral Properties Study;
激光刻蚀法制备金属纳米颗粒及其光谱特性研究
The Study of Reticulating IRFPA by Laser Etching
激光刻蚀法网格化热释电红外焦平面探测器的实验研究
laser engraving, laser etching
激光雕刻，激光蚀刻
gas discharge etching
气体放电蚀刻[法]
Concave Microlens Arrays Produced by Femtosecond Laser With HF Acid Etching
飞秒激光和酸刻蚀方法制作凹面微透镜阵列
The most prevalent procedure is to use photolithography or electron-beam lithography to produce a pattern in a layer of photoresist on the surface of a silicon wafer.
最常用的步骤是用光蚀刻或电子束蚀刻法，在矽晶圆表面的光阻层上制作出图案。
photoresist controlled etch
光刻胶掩蔽控制腐蚀
fine featured resist
精细结构光刻用抗蚀剂
Improvement for Extraction Efficiency of Vertical GaN-Based LED on Si Substrate by Photo-Enhanced Wet Etching
光增强湿法刻蚀提高Si衬底垂直结构GaN基LED的出光效率
Over 8 years experience in Implant /Diffusion/ Etch/ Photo process.
8年注入/扩散/刻蚀/光刻经验。
bichromated albumen process
重铬酸盐蛋白蚀刻法
SiO_2/Si dry etching with XeF_2
XeF_2对SiO_2/Si的干法刻蚀
In situ Monitoring Etch Process and Endpoint for LSI by the Plasma Emission Spectroscopy
大规模集成电路刻蚀过程和终点的在线监测──等离子发射光谱法
Studies of Dry Etching and Ions Implantation on the Luminescence Property of Ⅲ-Ⅴ Group Semiconductor Quantum Wells;
干法刻蚀和离子注入影响Ⅲ-Ⅴ族半导体量子阱发光特性研究
Vacuum-ultraviolet Blazed Silicon Gratings Anisotropically Wet-etched by a Native-oxide Mask
利用天然氧化层掩模的真空紫外硅闪耀光栅的湿法刻蚀制作
Fabrication and Characterization of General Microcups with Flexibility and Solvent-resistance by UV Photo-mask Lithography
掩膜光刻法制备柔性抗蚀电子纸微杯及其性能表征
PROCESS PARAMETERS DETERMINATION OF ETCHING LITHOGRAPHY SERVO DISK BY HF SPUTTERING
利用高频溅射刻蚀光刻伺服盘工艺参数的确定
brilliant cutting
(玻璃)磨光刻花法
