The porous ceramics, of which main crystals is the quartz and mullite, has been developed by using ceramic polished waste as the main raw material in this paper.
以建筑陶瓷抛光废料为主要原料研制了以石英和莫来石为主晶相的多孔陶瓷轻质砖,并采用XRD、显微镜分析了建筑陶瓷抛光废料掺量对多孔陶瓷轻质砖的晶相、气孔结构和断裂模数的影响。
The ultra-fine CeO2 precursor for optical glass polishing material was prepared by selective oxidation and precipitation, washing, drying and calcination from low-cerium complex rare earth chlorides solution with NH3.
以低铈混合氯化稀土为原料,NH3·H2O为沉淀剂,空气和H2O2为氧化剂,经选择性氧化沉淀、洗涤、烘干、煅烧制备用于光学玻璃抛光材料的超细CeO2前驱体。
The initial research result indicates that the nanodiamond should be a kind of ideal polishing material for super precision polishing process.
纳米金刚石兼具有金刚石和纳米颗粒的双重特性,初步研究结果表明纳米金刚石应该是一种理想的超精抛光材料。
Material removal characteristic of silicon wafers in chemical mechanical polishing
单晶硅片化学机械抛光材料去除特性
Study on the Mechanism and Arts of Magnetorheological Finishing (MRF) by Nano-sized Diamond Abrasives
纳米金刚石磨料磁流变抛光材料去除机理与工艺研究
The Study of Polyimide with Abrasive as a Kind of Grinding Slice;
聚酰亚胺中添加磨粒作为新型抛光材料的初步研究
Experimental and Theoretical Study on the Material Removal in the Chemical Mechanical Polishing at Molecular Scale;
基于分子量级的化学机械抛光材料去除机理的理论和试验研究
Detection of Subsurface Damage and Material Removal Mechanism in Optical Polishing Process
光学材料抛光亚表面损伤检测及材料去除机理
A Study on Key Techniques in Ultra-Precision Lapping and Polishing for Optical SiC Materials;
SiC光学材料超精密研抛关键技术研究
A Reaserch of the Principle of Nano-Processing Nano-Processing Experiment of Ice Desk Polishing on Metal Materials;
金属材料冰盘抛光纳米加工机理研究
Research of Polishing Technology for InSb Semiconductor Materials
InSb半导体材料抛光研磨技术研究
Study on material removal theoretical model of zone polishing technology
环带抛光技术材料去除理论模型研究
Three-dimensional Material Removal Model of Magnetorheological Finishing(MRF)
磁流变抛光过程的材料去除三维模型
Influence of Slurry Particle Size on Materials Removal Rate and Roughness in High Power Laser Glass Material Polishing
抛光粉颗粒度对高功率激光玻璃材料抛光效率和粗糙度的影响
Using refined grinding material to polish in order to get the mirror effect.
采用精细磨料抛光形成镜面效果的材料。
Study on Chemical Mechanical Polishing of Tantalum Lithium Crystal Wafer;
光电子材料钽酸锂晶片化学机械抛光过程研究
Electrochemical Polishing Process Conditions for NiW Alloy Substrates in Superconductivity Materials;
超导材料NiW合金基带电化学抛光工艺研究
Study on Material Removal Mechanism for Non-contact CMP;
非接触化学机械抛光的材料去除机理研究
Study of the capability of magnetorheological finishing on MgF_2 materials
MgF_2红外材料的磁流变抛光性能实验及分析
The Study of the Polishing Analysis of the Super-Smooth Surface of the Low-Temperature and Semi-Consductor Materials without Abrasive
半导体材料低温无磨料超光滑表面抛光分析的研究
Study on Erosion Mechanisms and Polishing Technology of Hard-Brittle Materials Machined with Precision Abrasive Waterjet;
精密磨料水射流加工硬脆材料冲蚀机理及抛光技术研究
