By means of XRD and DTA, were studied the atomic distribution functions and crystallization process of amorphous Ni-P alloys prepared by impulse electroless and electroless plating.
利用X射线衍射(XRD)及热分析(DTA)技术,研究了脉冲化学镀与化学镀非晶态Ni-P合金的原子分布函数及晶化过程,得出了两种非晶态合金的微观结构信息(平均原子间距,相应配位原子数和短程有序畴)及各特征温度的晶化激活能。