In this paper,extreme ultraviolet lithography technique is analyzed from the aspects of extreme ultraviolet light source,extreme ultraviolet optical system,reflective mask,resist,stepper,i.
本文从极端远紫外光源、极端远紫外光学系统、反射掩模、光刻胶、光刻机等方面对极端远紫外光刻技术进行了分析论述 ,并且对它的应用前景进行了简要分
In this paper,the home-made x-ray mask fabri-cation process is introduced firstly,then a two layer resists method which is used to fabricate deep-submicron T-shaped gate and some initial research results are described,and the domestic deep-submicron lithography status is analyzed .
本文中我们首先对我们的x射线掩模制造工艺进行介绍,然后论述了一种用于制造深亚微米T形栅的两层胶工艺,介绍了所取得的一些研究结果,最后对国内的深亚微米光刻现状进行了简要分析。
