The roots of the equation of the ray velocity are analyzed and the ray axes is determined.
详细分析了光线速度方程的根,并由此定出光线轴的位置。
The influence of the parameters during the polishing process such as the types of polishing powder, the polishing speed, the characters of the polishing glass, on the properties of the polished components has been studied, and the detailed analysis has been made based on the polishing theory.
研究了抛光粉的种类、抛光速度的大小以及抛光玻璃的性质等抛光参量对光学元件亚表层特征的影响,并结合抛光机理进行了分析。
The study indicates that the thickness of slurry layer increases with increasing polishing speed and the increasing trend decreases with increasing polishing rotational speed.
研究表明,抛光液膜厚度随着抛光速度的增加而增加,增加的趋势随抛光转速的提高而减缓。
